Items tagged with Common Platform Initiative
At yesterday's Common Platform technology day, IBM and the other members of the Common Platform Initiative made a major announcement. While plans to use gate-first technology at the 32nm/28nm node remain unchanged, the coalition will move to gate-last technology when it makes the jump to 20nm production. As semiconductor manufacturing has moved to ever-smaller process nodes, the difficulty of managing each transition has increased markedly. As a result, the major foundries have adopted divers methods of improving product yields and minimizing gate leakage. Examples of these methods include AMD's adoption of immersion lithography at 45nm, Intel's simultaneous decision to use double-patterning...
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